product introduction：

Cobalt disilicide (CoSi2) has low resistivity and good thermal stability. It is currently widely used as a contact in large-scale integrated circuits, and CoSi2 has a crystal structure similar to Si, so epitaxial CoSi2 can be formed on a Si substrate /Si structure, used to study the interface characteristics of epitaxial metal silicon.

Performance character：

1.High purity: the highest purity can reach 99.99%, XRD detect no impurity phase；

2.Concentrated distribution: standard normal particle size distribution, no bimodal or multimodal.

Technical Specification：